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III-V integrated circuit fabrication technology Shiban Tiku, Dhrubes Biswas

By: Contributor(s): Material type: TextTextPublication details: Singapore : Pan Stanford Publishing, c2016.Description: xxv, 687 p. : ill. ; 24 cmISBN:
  • 978-9814669306
Subject(s): DDC classification:
  • .
Online resources: Summary: Tiku and Biswas present a desk reference for practicing engineers and graduate students new to the field of III-V semiconductor integrated circuit processing. He specifically addresses the needs of students who know semiconductor theory but lack detailed processing knowledge. The topics include GaAs devices, phase diagrams and crystal growth of compound semiconductors, plasma processing and dry etching, Schottky diodes and field-effect transistor processing, backend processing and through-wafer vias, and radio frequency microelectromechanical systems. Distributed by CRC Press, A Taylor & Francis Group member. Annotation ©2016 Ringgold, Inc., Portland, OR (protoview.com)
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Holdings
Item type Current library Call number Status Date due Barcode
REGULAR University of Wollongong in Dubai Main Collection 621.3815 IN TE (Browse shelf(Opens below)) Available T0054761

Other Titles: Three-five integrated circuit fabrication technology 3-5 integrated circuit fabrication technology

Tiku and Biswas present a desk reference for practicing engineers and graduate students new to the field of III-V semiconductor integrated circuit processing. He specifically addresses the needs of students who know semiconductor theory but lack detailed processing knowledge. The topics include GaAs devices, phase diagrams and crystal growth of compound semiconductors, plasma processing and dry etching, Schottky diodes and field-effect transistor processing, backend processing and through-wafer vias, and radio frequency microelectromechanical systems. Distributed by CRC Press, A Taylor & Francis Group member. Annotation ©2016 Ringgold, Inc., Portland, OR (protoview.com)

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